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Removal of ultrafine particles below 45nm required for semiconductors and liquid crystals.
Concentrated control of output due to built-in CPU High-frequency ultrasonic cleaner capable of feedback on operating status
Ultrasonic cleaning solution is sprayed from the nozzle tip.
This is an introduction to the spot shower ultrasonic cleaning machine handled by Kaijyo Corporation.
Cleaning device using Phoenix 26 kHz / 38 kHz / FM.
Ultrasonic cleaning using cavitation in the 26 kHz or 38 kHz range is used for cleaning oil stains and other contaminants attached to metal machined parts. Generally, the process involves ultrasonic alkaline cleaning → ultrasonic rinsing → drying. Our Phoenix II 26 kHz and Legend 38 kHz/FM are equipped with high-performance constant output circuits, providing consistently stable cleaning power, which has led to their adoption and positive feedback from many cleaning equipment manufacturers.
This cleaning power, and at a low price.
The new Three has been introduced to the highly acclaimed Phoenix with high cleaning power. 1. Initialize Function Automatically sets the optimal operating point for various conditions such as cleaning solution, liquid temperature, and liquid depth with simple operations. It can be used under optimal conditions even if the transducer is replaced. 2. Triple Check Function for "Operation" Standard equipped with three necessary check functions when the device is installed: READY (standby), six types of alarm checks, and interlock stop terminals for GO (oscillation). 3. Power Voltage Change Function Allows for easy changes to the corresponding power voltage from the operation panel. 4. Output Control Ultrasonic output can be set in 10 levels from 10% to 100%. External control is also possible. 5. Diverse Mode Settings Equipped with three types of oscillation modes, three types of operation modes, and three types of setting modes. 6. No need for complicated notifications to the General Communications Bureau for compliance with Radio Law type designation.
Optimal for single wafer cleaning of LCD and wafer substrates.
Ultrasonic cleaning machine with a simple structure and high cleaning efficiency using a special reflection method.
Precision cleaning of solar cells, FPD substrates, and HD substrates.
- A new generation cleaning machine compatible with 430 kHz and 950 kHz. - Inherits the high functionality of QUAVA, optimal for single-sheet cleaning. - Cleaning solution with ultrasound is sprayed from a tube-shaped nozzle. - Uniform cleaning is possible with a highly flexible tube-shaped nozzle. - Compatible with side and back irradiation. ● The tube can be selected from three types: front irradiation method, shower irradiation method, and side irradiation method. ● Due to the tube-type nozzle, it is easy to install equipment without limiting the space for the transducer.
